公司生產的鉻靶材采用先進的熱等靜壓（HIP）工藝生產，產品包括矩形靶、圓弧靶、環形靶和大長徑比整體成形管靶等類型，具有純度和密度可控、晶粒細小均勻、使用壽命長等優點。Ourchromiumtargetincludingrectangulartarget,arctarget,ringtargetandlargeaspectratiointegralformingtubetargetismanufacturedbyhotisostaticpressingtechnologyandhastheadvantagesofcontrollablepurityanddensity,fineanduniformgrainsizeandlongservicelife.?鉻靶Chromiumtarget性能Productperformance純度/%Purity?????99.599.95密度/g/cm3Density??????≥7.12≥7.12晶粒度/μmGrainsize??????≤100≤100金屬雜質總和/ppmTotalcontentofmetallicimpurities???????≤5000≤500熱導率/W/m.KThermalconductivity??????60100熱膨脹系數/1/KCoefficientofthermalexpansion????????8×10-68×10-6規格尺寸/mmSize平面靶Planartarget≤1500×500≤1500×500旋轉靶Rotatingtarget熱等靜壓整體成形IntegralformingbyHIP長度Length≤2000厚度Thickness≤15熱等靜壓整體成形IntegralformingbyHIP長度Length≤2000厚度Thickness≤152N5??微量元素(Traceelements)PPM??≥7.12g/cm3成分鐵（Fe）鋁(Al)硅(Si)碳(C)硫（S）氧(O)氮(N)標準（Standard）≤1500≤1200≤1500≤200≤50≤1400≤300測試值（Testvalues）98030060062501200200??2N8??微量元素(Traceelements)PPM??≥7.12g/cm3成分鐵（Fe）鋁(Al)硅(Si)碳(C)硫（S）氧(O)氮(N)標準（Standard）≤800≤300≤400≤200≤50≤1000≤100測試值（Testvalues）7407892845034030??3N??微量元素(Traceelements)PPM??≥7.12g/cm3成分鐵（Fe）鋁(Al)硅(Si)碳(C)硫（S）氧(O)氮(N)標準（Standard）≤500≤100≤150≤150≤30≤500≤100測試值（Testvalues）2904780902845050?3N5??微量元素(Traceelements)PPM??≥7.12g/cm3成分鐵（Fe）鋁(Al)硅(Si)銅(Cu)鎳（Ｎi)碳(C)硫（S）氧(O)氮(N)標準（Standard）≤100≤50≤50≤10≤50≤50≤30≤150≤80測試值（Testvalues）504540710242713730?附上鉻矩形靶、圓弧靶和環形靶照片

鉻管靶可加工成熱等靜壓（HIP）整體成型鉻管靶和噴涂鉻管靶，兩種鉻管靶相比，熱等靜壓整體成型鉻管靶具有氧含量低、致密度高、鍍膜均勻致密質量好等優點，缺點成本較高。Comparedwiththesprayingchromiumtubetarget,theintegralformingchromiumtubetargetbyHIPhastheadvantagesoflowoxygencontent,highdensity,uniformandcompactcoatingandsoon.?性能Productperformance噴涂鉻管靶材Sprayingchromiumtubetarget熱等靜壓整體成形鉻管靶材IntegralformingchromiumtubetargetbyHIP氧含量/ppmOxygencontent≤500080-1500鍍膜均勻性Depositionuniformity1.????整管軸向致密度相差較大2.????整爐上中下L、A、B值相差較大3.????無法保證產品膜層的一致性1.????Thedensityofthetubetargetalongtheaxialisdifferent.2.????ThevalueofL,AandBisdifferentinthewholefurnace.3.????Theconsistencyoftheproductfilmcannotbeguaranteed1.????整管均勻性高2.????密度接近于純金屬熱擠壓密度，管材通體密度一致3.????無松散區、無暗區4.????PVD膜層的厚度及顏色的一致性好5.????整爐上中下L、A、B值統一性好1.????Highuniformityofthewholetube2.????Thedensityofthewholetubetargetisclosetohotextrusiondensityandisconsistent3.????Nolooseareaanddarkarea4.????TheconsistencyofthethicknessandcolorofthePVDfilmisgood4.????ThevaluesofL,AandBinthewholefurnacearegood.5.????ThevalueofL,AandBisconsistentinthewholefurnace.鍍膜電流密度Depositioncurrentdensity無法實現大電流長時間工作Cannotworkforalongtimeatlargecurrent大功率長時間穩定工作Cansteadilyworkforalongtimeunderhighpower??附上鉻管靶照片（1張照片）

公司生產的氧化鈮靶材采用先進的真空熱壓、熱等靜壓和熱噴涂工藝生產，產品包括矩形靶、圓弧靶和管靶等類型。Ourniobiumoxidetargetincludingrectangulartarget,arctargetandtubetargetismanufacturedbyhotisostaticpressing,hotpressing,andthermalsprayingtechnology.OurniobiumoxidetargetbyHIPhasbeenappliedforChineseinventionpatentwithindependentintellectualpropertyrights.ThepatentnumberisCN105734506A.??氧化鈮靶Niobiumoxidetarget性能Productperformance化學成分/at%CompositionNb2Ox，x=4.5～4.8純度/%Purity99.99密度/g/cm3Density≥4.5晶粒度/μmGrainsize≤5金屬雜質總和/ppmTotalcontentofmetallicimpurities≤100電阻率/Ω.cmResistivity5×10-4規格尺寸/mmSize平面靶Planartarget熱等靜壓/熱壓，≤500×250Hotisostaticpressing/Hotpressing旋轉靶Rotatingtarget熱噴涂成形thermalspraying長度Length≤4000厚度Thickness≤10